شرکت مهندسی بسافن

ژنراتور پلاسمای فرکانس رادیویی

Matching Networks

Radiofrequency generators are designed and manufactured with an output impedance of 50 ohms according to standards. The plasma enclosure, plasma torch or other loads that require the application of RF power have and equivalent impedance other than 50 ohms and are usually accompanied by an inductor and capacitor segment. Therefore, a system is required to change the equivalent impedance to the generator impedance level in order to prevent the reflection of the power transmitted by the generator, protect the RF generator, maximize the power input to the load, make the processes repeatable, and provide the necessary field intensity in the enclosure before and after the formation of plasma. This task is carried out by the impedance matching network, also called the match box.
In normal situations, the matching network is built for an impedance range between 3 and 35 ohms. However, given the technical knowledge and practical experience of the Basafan group, providing matching networks for various load types such as sputter guns, RIEs, loads with capacitance-inductance coupling, and complicated loads such as helicon ion sources, atmospheric ICPs with E and H modes, atmospheric plasma torches, and loads with nonstandard or unconventional impedance ranges.

 All RF generator and match box models come with 18 months guarantees

atn1

The impedance matching boxes at Basafan are built both manually and automatically.

Automatic Impedance Matching Network
Automatic impedance matching networks made by Basafan, ATN-xx-BF, provide adaptability for the radiofrequency generator in applications such as PECVD, HDCVD, sputtering, and ashing. These networks use DC drive motors to perform the matching. The Basafan automatic matching system changes the plasma enclosure impedance to 50 ohms so that maximum generator power reaches the enclosure.
The Basafan automatic matching networks perform their operation in three independent modes. The automatic mode continuously compensates the impedance variation of the plasma enclosure. The manual mode allows the operator to change the matching capacitance values during the process. In the preset mode, the operator can automatically adjust the capacitance values close to the complete matching condition at the outset so that the matching is performed faster.
The various parameters can be adjusted and have their performance observed via the front panel of the controller system and the VGA connections.
One of the most important features of the Basafan ATN-xx-BF impedance matching networks is the short time (approximately 2 seconds) they take to form the plasma and perform complete matching for standard loads.

:Basafan Automatic Impedance Matching Networks (Match-Boxes) models

3 KV Automatic Impedance Matching Network, 13.56 MHz
4.5 KV Automatic Impedance Matching Network , 13.56 MHz
9 KV Automatic Impedance Matching Network , 13.56 MHz
15 KV Automatic Impedance Matching Network,13.56 MHz
25 KV Automatic Impedance matching network , 13.56 MHz

Technical specifications

 

ATN03BF

ATN04BF ATN09BF ATN15BF ATN25BF

Frequency (MHz)

13.56

13.56

13.56

13.56

13.56

Input Power (W)

20-300

20-1000

50-2000

50-3000

50-5000

Output Impedance (ohms)

50

50

50

50

50

Output Voltage (KV)

3

4.5

9

15

25

 Output Current (Arms)

10

15

40

80

120

Input Connector

N

N

N

N

7/16

Output Connector

N

7/16 or Direct connection

7/16 or Direct connection

Direct connection

Direct connection

 Input Voltage (Vac)

200-220

200-220

200-220

200-220

200-220

Cooling

Air-Cooled

Air/water-cooled

Air/Water-Cooled

Air/Water-Cooled

Air/Water-Cooled

Touch Screen

Yes

Yes

Yes

Yes

No

Input Power

Single-phase

Single-phase

Single-phase

Single-phase

3phase

Cooling

air-cooled

Water/air-cooled

Water/air-cooled

Water/air-cooled

Water/air-cooled

Basafan Manual Impedance Matching Network

Manual impedance matching networks made by Basafan, MTC-xx-BF, provide matching for the radiofrequency generators in applications such as PECVD, HDCVD, sputtering, and ashing. These networks perform matching by the graded volumes in the front panel of the system. The Basafan manual matching system changes the plasma enclosure impedance to 50 ohms so that maximum generator power reaches the enclosure.

Some of the benefits of the MTC-xx-BF model are moderately prices and a wide range of impedance and even custom impedance ranges. Also, the gearbox in its structure has increased the adjustment accuracy.

matchboxx

:Basafan Manual Impedance Matching Networks (Match-Boxes) models

3 KV Manual Impedance Matching Network, 13.56 MHz
4.5 KV Manual Impedance Matching Network , 13.56 MHz
9 KV Manual Impedance Matching Network , 13.56 MHz
15 KV Manual Impedance Matching Network,13.56 MHz
25 KV Manual Impedance matching network , 13.56 MHz

Technical specifications

 

MTC03BF

MTC04BF MTC09BF MTC15BF MTC25BF

Frequency (MHz)

13.56

13.56

13.56

13.56

13.56

Input Power (W)

20-300

20-1000

50-2000

50-3000

50-5000

Output Impedance (ohms)

50

50

50

50

50

Output Voltage (KV)

3

4.5

9

15

25

 Output Current (Arms)

10

15

40

80

120

Input Connector

N

N

N

N

7/16

Output Connector

N

7/16 or Direct connection

7/16 or Direct connection

Direct connection

Direct connection

 Input Voltage (Vac)

200-220

200-220

200-220

200-220

200-220

Cooling

Air-Cooled

Air/water-cooled

Air/Water-Cooled

Air/Water-Cooled

Air/Water-Cooled

Touch Screen

Yes

Yes

Yes

Yes

No

Input Power

Single-phase

Single-phase

Single-phase

Single-phase

3phase

Cooling

air-cooled

Water/air-cooled

Water/air-cooled

Water/air-cooled

Water/air-cooled

In case you need consultation or you have any questions, you can contact Basafan experts via +98-21-66033430 or This email address is being protected from spambots. You need JavaScript enabled to view it. .

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