شرکت مهندسی بسافن

ژنراتور پلاسمای فرکانس رادیویی

The automatic matching network changes the impedance of the plasma chamber to 50 ohms to reach the maximum power from the generator to the chamber. The Basafan automatic matching networks perform their operation in three independent modes. The automatic mode continuously compensates the impedance variation of the plasma enclosure. The manual mode allows the operator to change the matching capacitance values during the process. In the preset mode, the operator can automatically adjust the capacitance values close to the complete matching condition at the outset so that the matching is performed faster.
The various parameters can be adjusted and have their performance observed via the front panel of the controller system and the VGA connections.

Some of special applications of this device are plasma production for various uses, such as the different stages of deposition (cleaning, etching, sputtering, etc.) as well as the fabrication of microelectronics components in nanotechnology field.

 

 All RF generator and match box models come with 18 months guarantees

  

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Features and capabilities

• Automatic matching of a wide range of impedances
• Control/display of all parameters
• Complete remote control capability
• Three operation modes: manual, automatic, and preset
• Digital display of capacitor locations and capacitor limitation alarms
• Location adjustment for the capacitors in manual mode using a digital rotary encoder in the control panel
• Unit control box installable in a rack
• Separate match box installable near the enclosure
• Reserve capacitor sets and inductor change tabs for increasing the load impedance range
• Adequate shielding for preventing radiation and EMI noise with necessary arrangements for protecting operator health.