Manual impedance matching networks made by Basafan, MTC-xx-BF, provide matching for the radiofrequency generators in applications such as PECVD, HDPCVD, sputtering, ashing and so on. These networks perform matching by DC drive motors. The Basafan manual matching system changes the plasma chamber impedance to 50 ohms so that maximum generator power reaches the chamber.
The Basafan manual matching networks perform their operation in one mode. This mode allows the operator to change the matching capacitors values during the process. The capacitors values can be adjusted and controlled via the front panel of the device. The values of capacitor location are displayed on the device's LCD, too.
All RF generator and match box models come with 18 months guarantees
Technical Specifications
Applied Power | 220 (200-240) V, 50 (50-60) Hz |
Maximum Input RF Power (W) & Maximum output voltage-current | 3000 W for standard load such as sputtergun (limited to 15 KV voltage and 80 A current) |
Frequency (MHz) | 13.56 |
Band width | 5% |
Network topology | L network |
Maximum voltage for series capacitor | 15 KV |
Maximum current for series capacitor | 80 A |
Output impedance | Standard range 5 to 30 ohms. It performs matching for the sputtering cathode to a wide range. |
Working temperature | 10-40 C |
Cooling | Air/water-cooled |
Input Connector | Female N |
Output connector | direct connection to load |
Dimesions | 14*25*45 (length*width*height) |
Weight | about 9 Kg |
Box Material | Aluminium |
