شرکت مهندسی بسافن

The corona plasma torch is a system used for the processing of two- and three-dimensional polymeric surfaces. This plasma is created under atmospheric pressure by applying an alternating voltage with a frequency of several tens of thousands of kilohertz between two electrodes. This device is used for increasing the printability of three-dimensional polymeric and metallized parts.
Creating or increasing the Nanoscale surface roughness is among the features of this process. It is expected in this state that the wetting and color absorption qualities of fabric surfaces increase. Also, the presence of an active surface layer significantly improves the adhesion of coatings and Nano-layers by creating bonds at the atomic level.
The plasma torch system can be used for increasing printability, improving the absorption and stability of printing ink, labelling, and improving surface adhesion in various surfaces.

In summary, the advantages of using corona plasma are as follows:

1. Uniform and smooth activation of surfaces even in three-dimensions
2. Rapid activation of surfaces and the possibility of use for large dimensions
3. Processing of openings and complicated surfaces in three-dimensional objects
4. Changing surface characteristics without changing volumetric characteristics
5. Economy and durability of adhesion characteristics
6. Environmental friendliness

Basafan produces vacuum plasma systems up to 20000L in volume, with LF or HF frequency bands, and plasma powers up to 100kW. The structure of the vacuum enclosure and equipment, the plasma generator, and other system components are designed according to the requirements of the customer, the product type, and the desired application.

Here are some photos of this system fabricating process.

Nowadays, high-voltage power supplies required in a wide array of equipment and applications. Switching power supplies are usually preferable due to their lower weight and higher efficiency. The Basafan high-voltage power supplies are offered in the 1000-120000 V range. An important feature of the power supplies made by Basafan, especially for voltages above 20 kV, is their smaller size and weight compared to the models in the market. For example, in the 40 kV, 1000 W model fully equipped and with a separable output probe, the dimensions of the power supply are 18 × 22 × 50 cm (length × width × height), and its weight is about 10 kg.
High stability, remote control capability, high-voltage separating probe and connector, controllable output current, arc management and various types of protection, voltage and current display, and a user interface panel have all turned these high-voltage power supplies into reliable industrial products.

Model:  HV5300BF

   The Basafan high-voltage power supplies are offered in the 1000-120000 V range. An important feature of the power supplies made by Basafan, especially for high voltages is the low storage energy in output stage and their small size. High stability, remote control capability, high-voltage separating probe and connector, controllable output current, arc management and various types of protection, voltage and current display, and a user interface panel have all turned these high-voltage power supplies into reliable industrial products.

The RF switch is used for connecting one source to several consumers. One special application of these high-power RF switches as a radiofrequency generator output switch among several electrodes or sputtering guns.

Radiofrequency generators are designed and manufactured with an output impedance of 50 ohms according to standards. The plasma enclosure, plasma torch or other loads that require the application of RF power have and equivalent impedance other than 50 ohms and are usually accompanied by an inductor and capacitor segment. Therefore, a system is required to change the equivalent impedance to the generator impedance level in order to prevent the reflection of the power transmitted by the generator, protect the RF generator, maximize the power input to the load, make the processes repeatable, and provide the necessary field intensity in the enclosure before and after the formation of plasma. This task is carried out by the impedance matching network, also called the match box.
In normal situations, the matching network is built for an impedance range between 3 and 35 ohms. However, given the technical knowledge and practical experience of the Basafan group, providing matching networks for various load types such as sputter guns, RIEs, loads with capacitance-inductance coupling, and complicated loads such as helicon ion sources, atmospheric ICPs with E and H modes, atmospheric plasma torches, and loads with nonstandard or unconventional impedance ranges.

 All RF generator and match box models come with 18 months guarantees

The impedance matching boxes at Basafan are built both manually and automatically.

Automatic Impedance Matching Network
Automatic impedance matching networks made by Basafan, ATN-xx-BF, provide adaptability for the radiofrequency generator in applications such as PECVD, HDCVD, sputtering, and ashing. These networks use DC drive motors to perform the matching. The Basafan automatic matching system changes the plasma enclosure impedance to 50 ohms so that maximum generator power reaches the enclosure.
The Basafan automatic matching networks perform their operation in three independent modes. The automatic mode continuously compensates the impedance variation of the plasma enclosure. The manual mode allows the operator to change the matching capacitance values during the process. In the preset mode, the operator can automatically adjust the capacitance values close to the complete matching condition at the outset so that the matching is performed faster.
The various parameters can be adjusted and have their performance observed via the front panel of the controller system and the VGA connections.
One of the most important features of the Basafan ATN-xx-BF impedance matching networks is the short time (approximately 2 seconds) they take to form the plasma and perform complete matching for standard loads.

:Basafan Automatic Impedance Matching Networks (Match-Boxes) models

3 KV Automatic Impedance Matching Network, 13.56 MHz
4.5 KV Automatic Impedance Matching Network , 13.56 MHz
9 KV Automatic Impedance Matching Network , 13.56 MHz
15 KV Automatic Impedance Matching Network,13.56 MHz
25 KV Automatic Impedance matching network , 13.56 MHz

Basafan Manual Impedance Matching Network

Manual impedance matching networks made by Basafan, MTC-xx-BF, provide matching for the radiofrequency generators in applications such as PECVD, HDCVD, sputtering, and ashing. These networks perform matching by the graded volumes in the front panel of the system. The Basafan manual matching system changes the plasma enclosure impedance to 50 ohms so that maximum generator power reaches the enclosure.

Some of the benefits of the MTC-xx-BF model are moderately prices and a wide range of impedance and even custom impedance ranges. Also, the gearbox in its structure has increased the adjustment accuracy.

:Basafan Manual Impedance Matching Networks (Match-Boxes) models

3 KV Manual Impedance Matching Network, 13.56 MHz
4.5 KV Manual Impedance Matching Network , 13.56 MHz
9 KV Manual Impedance Matching Network , 13.56 MHz
15 KV Manual Impedance Matching Network,13.56 MHz
25 KV Manual Impedance matching network , 13.56 MHz

In case you need consultation or you have any questions, you can contact Basafan experts via +98-21-66033430 or This email address is being protected from spambots. You need JavaScript enabled to view it. .

The radiofrequency (RF) generators manufactured by Basafan are reliable devices for industrial and laboratory deposition, plasma generation, and even dielectric heating and melting. This device is also one of the most important components of semiconductor manufacturing systems, used for producing integrated circuits (ICs) and chips present in modern computers and electronic equipment. The Basafan RF generator along with its impedance matching network constitute a complete RF plasma generation assembly.

The RF generator is designed and built with 27.12 MHz, 13.56 MHz, 2 MHz or other frequency bands according to the customer .

Why 13.56 MHz?

This frequency is one of the most commonly used in the industrial, scientific, and medical (ISM) radio bands. This band allows for high-power activities without causing any disturbance in the surrounding telecommunications systems since it is for general use. Generators with powers ranging from a few miliwatts to several hundred kilowatts are used in this band.

Basafan radiofrequency (RF) generators

With a working frequency of 13.56 MHz and a variable output power, Basafan radiofrequency generators are currently the most advanced generators on the Iranian market. Designing these generators is a combination of radiofrequency electronics, advanced power amplifier protection, closed-loop control, and high safety factors. Simple manufacture and repair procedures and a very high efficiency are some of the unique qualities of this product. Other features include security against generation of electromagnetic interference, continuous operation capability, ease of operation and control, declaring the type of the produced errors, display of transmitted and reflectedpower, 0-5 V input voltage for controlling the output power of the generator (optional), analog output for transmitted and reflectedpower values (optional), the capability of limiting the reflectedpower, and a compressed air cooling system. Basafan produces this equipment in models ranging from 100 W up to 15 kW with semiconductor components and up to 100 kW with amplifiers based on vacuum tubes.

BasaFan RF Generators Models

RFG 200 watts

RFG 300 watts

RFG 600 watts

RFG 1000 watts

RFG 2000 watts

RFG 5000 watts

All RF generator and match box models come with 18 months guarantees

In case you need consultation or you have any questions, you can contact Basafan experts via +98-21-66033430 or This email address is being protected from spambots. You need JavaScript enabled to view it..

The radiofrequency (RF) generators manufactured by Basafan are reliable devices for industrial and laboratory deposition, plasma generation, and even dielectric heating and melting. This device is also one of the most important components of semiconductor manufacturing systems, used for producing integrated circuits (ICs) and chips present in modern computers and electronic equipment. The Basafan RF generator along with its impedance matching network constitute a complete RF plasma generation assembly.

The RF generator is designed and built with 27.12 MHz, 13.56 MHz, 2 MHz or other frequency bands according to the customer .

Why 13.56 MHz?

This frequency is one of the most commonly used in the industrial, scientific, and medical (ISM) radio bands. This band allows for high-power activities without causing any disturbance in the surrounding telecommunications systems since it is for general use. Generators with powers ranging from a few miliwatts to several hundred kilowatts are used in this band.

Basafan radiofrequency (RF) generators

With a working frequency of 13.56 MHz and a variable output power, Basafan radiofrequency generators are currently the most advanced generators on the Iranian market. Designing these generators is a combination of radiofrequency electronics, advanced power amplifier protection, closed-loop control, and high safety factors. Simple manufacture and repair procedures and a very high efficiency are some of the unique qualities of this product. Other features include security against generation of electromagnetic interference, continuous operation capability, ease of operation and control, declaring the type of the produced errors, display of transmitted and reflectedpower, 0-5 V input voltage for controlling the output power of the generator (optional), analog output for transmitted and reflectedpower values (optional), the capability of limiting the reflectedpower, and a compressed air cooling system. Basafan produces this equipment in models ranging from 100 W up to 15 kW with semiconductor components and up to 100 kW with amplifiers based on vacuum tubes.

BasaFan RF Generators Models

RFG 200 watts

RFG 300 watts

RFG 600 watts

RFG 1000 watts

RFG 2000 watts

RFG 5000 watts

All RF generator and match box models come with 18 months guarantees

In case you need consultation or you have any questions, you can contact Basafan experts via +98-21-66033430 or This email address is being protected from spambots. You need JavaScript enabled to view it..

Radiofrequency generators are designed and manufactured with an output impedance of 50 ohms according to standards. The plasma enclosure, plasma torch or other loads that require the application of RF power have and equivalent impedance other than 50 ohms and are usually accompanied by an inductor and capacitor segment. Therefore, a system is required to change the equivalent impedance to the generator impedance level in order to prevent the reflection of the power transmitted by the generator, protect the RF generator, maximize the power input to the load, make the processes repeatable, and provide the necessary field intensity in the enclosure before and after the formation of plasma. This task is carried out by the impedance matching network, also called the match box.
In normal situations, the matching network is built for an impedance range between 3 and 35 ohms. However, given the technical knowledge and practical experience of the Basafan group, providing matching networks for various load types such as sputter guns, RIEs, loads with capacitance-inductance coupling, and complicated loads such as helicon ion sources, atmospheric ICPs with E and H modes, atmospheric plasma torches, and loads with nonstandard or unconventional impedance ranges.

 All RF generator and match box models come with 18 months guarantees

The impedance matching boxes at Basafan are built both manually and automatically.

Automatic Impedance Matching Network
Automatic impedance matching networks made by Basafan, ATN-xx-BF, provide adaptability for the radiofrequency generator in applications such as PECVD, HDCVD, sputtering, and ashing. These networks use DC drive motors to perform the matching. The Basafan automatic matching system changes the plasma enclosure impedance to 50 ohms so that maximum generator power reaches the enclosure.
The Basafan automatic matching networks perform their operation in three independent modes. The automatic mode continuously compensates the impedance variation of the plasma enclosure. The manual mode allows the operator to change the matching capacitance values during the process. In the preset mode, the operator can automatically adjust the capacitance values close to the complete matching condition at the outset so that the matching is performed faster.
The various parameters can be adjusted and have their performance observed via the front panel of the controller system and the VGA connections.
One of the most important features of the Basafan ATN-xx-BF impedance matching networks is the short time (approximately 2 seconds) they take to form the plasma and perform complete matching for standard loads.

:Basafan Automatic Impedance Matching Networks (Match-Boxes) models

3 KV Automatic Impedance Matching Network, 13.56 MHz
4.5 KV Automatic Impedance Matching Network , 13.56 MHz
9 KV Automatic Impedance Matching Network , 13.56 MHz
15 KV Automatic Impedance Matching Network,13.56 MHz
25 KV Automatic Impedance matching network , 13.56 MHz

Basafan Manual Impedance Matching Network

Manual impedance matching networks made by Basafan, MTC-xx-BF, provide matching for the radiofrequency generators in applications such as PECVD, HDCVD, sputtering, and ashing. These networks perform matching by the graded volumes in the front panel of the system. The Basafan manual matching system changes the plasma enclosure impedance to 50 ohms so that maximum generator power reaches the enclosure.

Some of the benefits of the MTC-xx-BF model are moderately prices and a wide range of impedance and even custom impedance ranges. Also, the gearbox in its structure has increased the adjustment accuracy.

:Basafan Manual Impedance Matching Networks (Match-Boxes) models

3 KV Manual Impedance Matching Network, 13.56 MHz
4.5 KV Manual Impedance Matching Network , 13.56 MHz
9 KV Manual Impedance Matching Network , 13.56 MHz
15 KV Manual Impedance Matching Network,13.56 MHz
25 KV Manual Impedance matching network , 13.56 MHz

In case you need consultation or you have any questions, you can contact Basafan experts via +98-21-66033430 or This email address is being protected from spambots. You need JavaScript enabled to view it..

Basafan produces vacuum plasma systems up to 20000L in volume, with LF or HF frequency bands, and plasma powers up to 100kW. The structure of the vacuum enclosure and equipment, the plasma generator, and other system components are designed according to the requirements of the customer, the product type, and the desired application.

Here are some photos of this system fabricating process.